OP-MX 250 Series (10″)
Flexible system combination, Sharp image function, precision mechanical structure, MX series be wide used in industrial inspection and metallurgical analysis
- New designed metallurgical frame with 6 inches stage, solid and steady, meets the requirement of professional market
- Research-grade illumination system and optical system, present uniform background and clear image
- New design of long working distance professional metallurgical objectives.
- High power objectives with semi-apochromatic technology.
- Get clear and sharp image under various kind of observations.
- Complete accessories meet different demand of combination.
- Precision mechanical structure, ergonomic design.
- Adopt UIS High-resolution, Long working distance, and infinity light path correcting system objective imaging technology
- Extending the multiplexing technology of objective, compatible infinity objective with all the observation methods. including bright & dark field observation, polarization and also provide with high clear and sharp image in each observation method.
- Aspherical surface Kohler illumination, increasing the viewing brightness.
- WF10 X(Φ25)super wide field Eyepiece, long working distance metallurgical objective with bright and dark field
- The Nosepiece can be equipped with detachable DIC differential interference device.
Model | OP-MX 250 | |
Viewing Head | Compensation free trinocular head, inclined 30° (50mm-75mm) | ● |
Eyepiece | WF10×/ 25 | ● |
WF10×/ 20 Eyepiece with scale of cross hair 0.1mm | ● | |
WF15X/17mm | ○ | |
WF20X/12.5mm | ○ | |
Infinite Plan APO Objective | 5×/0.1/∞/0 (BF/DF) LWD 29.4mm | ● |
10×/0.25/∞/0 (BF/DF) LWD 16mm | ● | |
20×/0.40/∞/0 (BF/DF) LWD 10.6mm | ● | |
40×/0.60/∞/0 (BF/DF) LWD 5.4mm | ● | |
50X/0.55/0 (BF/DF) LWD 5.1mm | ○ | |
80X/0.75/0 (BF/DF) LWD 4mm | ○ | |
100X/0.80/0 (BF/DF) LWD 3mm | ○ | |
Nosepiece | Quintuple nosepiece | ● |
Stage | 10” double layer mechanical stage 350×310mm, Moving range 250mm×250mm | ● |
Focusing | Coaxial coarse & fine adjustment with rack opinion, fine division 2μm | ● |
Light source | Epi-illumination with aperture iris diaphragm and field iris Diaphragm Halogen | ● |
12V/100W, AC 85V-230V, brightness adjustable | ● | |
Polarizing device | Analyzer rotatable 360, polarizer & analyzer can be moved in/out | ● |
Filter | Flashboard type filters – Green, Blue, neutrals | ● |
Checking tool | 0.01mm micrometer | ● |
Optional Accessories | 2 dimensional measurement software | ○ |
Professional metallurgical image analysis software | ○ | |
DIC (10X, 20X, 40X, 100X) | ○ | |
Photography attachment and CCD adapter 0.5X, 0.57X, 0.75X | ○ | |
Planish tool | ○ | |
CCD camera, color 1/3” High resolution 520 TV lines | ○ | |
Note: ● Standard Outfit, ○ Optional |
Applications
OP-MX 250 industrial microscope is equipped with a large moving range mechanical stage, Epi-illuminator, long working distance bright and dark field Infinite Plan objectives, wide field eyepiece with clear images and good contrast. It is developed and aimed at the semiconductor industry, wafer manufacturing, electronic in formation industry, metallurgical industry, and used as high grade industrial microscope. Bright & Dark field observation, EPI-polarizing and DIC observation can proceed. It is widely used in Factories, Research institution and college and Universities to identify and analyze Wafer, FPD, Circuit substrate, Precision moulds.
Bright filed observation (Reflected illumination)
IC 5X Bright filed
IC 100X Bright field
Bright field observation (Transmitted illumination)
LC 10X Transmitted illumination
Oblique illumination
FPC 10X Bright filed
FPC 10X Oblique illumination
Dark filed observation
FPC 10X Dark filed
Simple Polarizing
PCB Cross section 20X Polarizing
DIC observation
Conducting particles 20X DIC
Wafer 50X DIC
Various interference filters
Photo and video accessories
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